
This information is
presented, mainly, as an aid to those who are
looking for someone to help them
on their projects.

The items 160 &165 are part of a LASER interferometer measurement system
used for measuring the XY stage (110) position. The master image, or reticle
(140), is re-imaged on the wafer which is sitting on plate 100. The wafer has a
photo sensitive coating, like the film used in a camera, and its called photo resist.
The photo resist records each image. Item 135 is the
illuminator. After the wafer is exposed, it is developed in a solution which
removes the resist (positive resist process) in the areas that were illuminated
through the reticle. The remaining resist defines the areas of the wafer which
are not to be affected by the subsequent
processing (etching, coating...etc.).
My project history.
Updated: Febuary 2012
My thanks goes out to those
who have given me projects to work on. Please
feel free to contact me at any time, about any issue. I look forward to hearing
from you. I would like to help you with any task you have in
mind.
Thank you for your consideration, concerning the use of my help.
My current rate per hour is: $120 USD.
Here are a few of the tools I have used:
| Mechanical | Optical | Electrical | Some Miscellaneous Items |
| SYNOPSYS | Micro-Cap (Evaluation) | Tools, Odds & Ends |
The following is a chronological list of projects I have been a part of:
1968-72 Went to school. Received BSEE degree from UC Berkeley. I was about 25, at the start.
1972-74 Built various machines for
semiconductor mask makers. Worked for Ultratech Corp..
Responsibilities: VP & General manager, Electrical design, Optical design,
Inventory system development
1974-82 Built a wafer step and repeat camera.
Worked for Ultratech Corp.. The
first units model number was 900.
Responsibilities:
-VP & General manager
-Test resists, Test lenses
-Assemble, align, test, and modify the air bearing stage and copy lens
-Design and write the operating program. The computer I used was an
HP9825 Desk Top calculator
running in HP's "HPL" language.
-Design, and assemble, the optical alignment system including its electronics
and software
-Develop manufacturing systems for production of all assemblies
1982-89 Built various system and sub system tests for the Ultratech Stepper. Worked as a consultant to Ultratech Stepper Corp..
Started Semifusion Corp.. This was for the purpose of producing electronics for the Ultratech Wafer Stepper. My brother Bill, also an electrical engineer, owns and runs this this company.
1986-89 Built the prototype alignment system for an X-Ray wafer stepper. Also built air bearing stage parts and created designs for improved stage performance. This was done as a consulting arrangement with Hampshire Instruments.
1989-98 Built various process machine electronic control systems and operating programs. EDC/Accord Technology builds equipment for hard disk manufactures. This was done as a consulting arrangement.
1990-91 Built prototype electronics and controls for a 10kw induction heater. The unit was used to dry can lids and was first used by COORS Beer, as I understand. This was done as a consulting arrangement with Mountain Gate Engineering, Campbell, CA.
1991- 2005 Design and/or test: (optical and E-beam) semiconductor lithography stages, lithography tool main bodies, opto-mechanical assemblies, and related items for Nikon Research Corporation of America. This is being done as a consulting arrangement.
1998-2000 Design and/or test: (E-beam)
semiconductor lithography stages, and related items for Ion
Diagnostics Inc. , Santa Clara, CA.. This was done as a consulting
arrangement.
Multi- Column E- Beam Technology
for Wafer Inspection (Spie
Paper)
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2002 Design a concept of an under water platform/stage for Raman spectrometry in the ocean, several thousand meters below sea level ( Report ). I worked on this task for the Monterey Bay Aquarium Research Institute, Moss Landing, California USA. This was done as a consulting arrangement.
2005-2009 Withdrew from my ongoing consulting
activities. Upon my Dad's death (March 2005) I decided to
spend my
portion of the inheritance given to me. I
am the oldest of 9 brothers and sisters who were to equally divide and share his
belongings.
2009-Current Work on items that others would
like me to help them with. This is typically done as a consulting
arrangement.
Patents which include myself as the inventor:
Patent Number |
Description
|
Date of Filing |
| US3783193 | Apparatus for activating a remotely located
device in response to the ringing of a called telephone subscriber
station. This was my first patent. I built this device for my Dad as a Christmas present that he could use to preheat his cabin at Lake Almanor, CA, I delivered it, as I remember about 2 Christmases later. This first one was built using timing motors with micro switches instead. I sold the rights to the patent for $1,800 and bought a stereo system for our living room. As I put up this page, it reminds me that the stereo, not functional, is in our front room, my wife still likes the cabinet. |
01/28/1971 |
| US4444492 | Apparatus for projection a series of images onto dies of a semiconductor wafer | 07/29/1982 |
| US5528118 | Guideless stage with isolated reaction stage. | 05/01/1994 |
| US5552888 | Apparatus for measuring position of an X-Y stage. | 12/02/1994 |
| US5708505 | Laser interferometer having a sheath for the laser beam. | 06/29/1996 |
| US5744924 | Guideless stage with isolated reaction frame. | 06/20/1996 |
| US5838450 | Direct reticle to wafer alignment using fluorescence for integrated circuit lithography. | 06/02/1995 |
| US5874820 | Window frame-guided stage mechanism. | 04/04/1995 |
| US5942871 | Double Flexure Support For Stage Drive Coil | 04/02/1996 |
| US5982128 | Lithography apparatus with movable stage and mechanical isolation of stage drive | 02/04/1998 |
| US6008500 | Exposure apparatus having dynamically isolated reaction frame | 05/27/1999 |
| US6020710 | Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame | 05/26/1999 |
| US6130490 | X-Y Stage with Movable Magnet Plate | 05/06/1999 |
| US6355994 | Precision Stage | 05/05/2000 |
| US6471435 | Flexural Joint | 05/05/2000 |
| US6646719 | Support Assembly for an Exposure Apparatus | 01/31/2001 |
Thank you for your consideration.
Martin E. Lee
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